Insights into the C–H Bond Activation on NiO Surfaces: The Role of Nickel and Oxygen Vacancies and of Low Valent Dopants on the Reactivity and Energetics-Reference-Cited by-同舟云学术

Insights into the C–H Bond Activation on NiO Surfaces: The Role of Nickel and Oxygen Vacancies and of Low Valent Dopants on the Reactivity and Energetics

Published:2017-08-16 Issue:33 Volume:121 Page:17969-17981
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Varghese Jithin John¹²^ORCID,Mushrif Samir H.¹

Affiliation:

1. School of Chemical and Biomedical Engineering, Nanyang Technological University Singapore, 62 Nanyang Drive, Singapore, 637459

2. Cambridge Centre for Advanced Research and Education in Singapore (CARES), Campus for Research Excellence and Technological Enterprise (CREATE), 1 CREATE Way, Singapore, 138602

Funder

National Research Foundation

Nanyang Technological University

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.7b05226

Reference67 articles.

1. Activated dissociative chemisorption of methane on Ni(100): a direct mechanism under thermal conditions?

2. Dissociation of CH4 on Ni(111) and Ru(0001)