Tuning the Valency of Heterogeneous Au–Silica Nanostructure via Controlled Ostwald Ripening Process
Author:
Affiliation:
1. Department of Chemistry, University of Connecticut, 55 North Eagleville Road, Storrs, Connecticut 06269-3060, United States
2. Institute of Materials Science, University of Connecticut, Storrs, Connecticut 06269-3060, United States
Funder
Division of Chemistry
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.8b04237
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