Iron Intercalation in Covalent–Organic Frameworks: A Promising Approach for Semiconductors-Reference-Cited by-同舟云学术

Iron Intercalation in Covalent–Organic Frameworks: A Promising Approach for Semiconductors

Published:2017-09-20 Issue:39 Volume:121 Page:21160-21170
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Pakhira Srimanta¹²,Lucht Kevin P.¹²,Mendoza-Cortes Jose L.¹²^ORCID

Affiliation:

1. Department of Chemical & Biomedical Engineering, Florida A&M University−Florida State University, Joint College of Engineering, Tallahassee, Florida 32310, United States

2. Condensed Matter Theory, National High Magnetic Field Laboratory (NHMFL), Scientific Computing Department, Materials Science and Engineering, High Performance Materials Institute (HPMI), Florida State University, Tallahassee, Florida 32310, United States

Funder

Start up funds FSU

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.7b06617

Reference42 articles.

1. Designed Synthesis of 3D Covalent Organic Frameworks

2. Designing 3D COFs with Enhanced Hydrogen Storage Capacity

3. A Crystalline Imine-Linked 3-D Porous Covalent Organic Framework