Submonolayer Is Enough: Switching Reaction Channels on Pt/SiO2 by Atomic Layer Deposition-Reference-Cited by-同舟云学术

Submonolayer Is Enough: Switching Reaction Channels on Pt/SiO2 by Atomic Layer Deposition

Published:2021-08-24 Issue:34 Volume:125 Page:18725-18733
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Tang Xin¹,Liu Chao²,Long Edmund A.³,Lin Wei¹^ORCID,Hackler Ryan A.¹^ORCID,Wang Xiang¹^ORCID,Marks Laurence D.³^ORCID,Notestein Justin M.²^ORCID,Stair Peter C.¹^ORCID

Affiliation:

1. Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States

2. Department of Chemical and Biological Engineering, Northwestern University, Evanston, Illinois 60208, United States

3. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States

Funder

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.1c04972

Reference62 articles.

1. Kinetics of OH(v= 0, 1) and OD(v= 0, 1) with CO and the mechanism of the OH + CO reaction

2. Real‐time clocking of bimolecular reactions: Application to H+CO2

3. Crossed beam studies of four‐atom reactions: The dynamics of OH+CO

4. Theoretical Studies of Polyatomic Bimolecular Reaction Dynamics

5. Quantum calculations of reaction probabilities for HO + CO→ H + CO2 and bound states of HOCO

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