Direct Photolithographic Patterning of Electrospun Films for Defined Nanofibrillar Microarchitectures-Reference-Cited by-同舟云学术

Direct Photolithographic Patterning of Electrospun Films for Defined Nanofibrillar Microarchitectures

Published:2010-01-21 Issue:4 Volume:26 Page:2235-2239
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Carlberg Björn¹,Wang Teng¹,Liu Johan¹²

Affiliation:

1. Department of Microtechnology and Nanoscience (MC2), Chalmers University of Technology, Göteborg SE-412 96, Sweden

2. Key Laboratory of Advanced Display and System Applications & SMIT Center, Shanghai University, Mechatronical Engineering and Automation Building, Box 282, No. 149 Yan Chang Road, Shanghai 200072, People’s Republic of China

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la9045447

Reference30 articles.

1. Electrospun Nanofibrous Membranes: A Novel Solid Substrate for Microfluidic Immunoassays for HIV

2. Nanostructured scaffolds for neural applications

3. Electrospinning processed nanofibrous TiO2membranes for photovoltaic applications

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