Self-Assembly of Poly(ferrocenyldimethylsilane-b-methyl methacrylate) Block Copolymers in a Selective Solvent-Reference-Cited by-同舟云学术

Self-Assembly of Poly(ferrocenyldimethylsilane-b-methyl methacrylate) Block Copolymers in a Selective Solvent

Published:2006-02-18 Issue:6 Volume:39 Page:2306-2315
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Korczagin Igor¹,Hempenius Mark A.¹,Fokkink Remco G.¹,Cohen Stuart Martien A.¹,Al-Hussein Mahmoud¹,Bomans Paul H. H.¹,Frederik Peter M.¹,Vancso G. Julius¹

Affiliation:

1. MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands; Laboratory of Physical Chemistry and Colloid Science, Wageningen University, 6700 EK Wageningen, The Netherlands; FOM AMOLF Institute for Atomic and Molecular Physics, 1009 DB Amsterdam, The Netherlands; and Electron Microscopy-unit, Department of Pathology, Maastricht University, 6200 MD Maastricht, The Netherlands

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma052521i

Reference50 articles.

1. Poly(ferrocenylsilane-block-methacrylates) via Sequential Anionic and Atom Transfer Radical Polymerization

2. Poly(ferrocenyldimethylsilanes) for Reactive Ion Etch Barrier Applications

3. High molecular weight poly(ferrocenediyl-silanes): synthesis and electrochemistry of [-(C5H4)Fe(C5H4)SiR2-]n, R = Me, Et, n-Bu, n-Hex

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