Nanometer Scale Gap Made by Conventional Microscale Fabrication:  Step Junction

Author:

Choi Jaewon1,Lee Kangho1,Janes David B.1

Affiliation:

1. School of Electrical and Computer Engineering, Purdue University, 465 Northwestern Ave., West Lafayette, Indiana 47907-2035

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls;Langmuir;2015-04-20

2. Long nanoscale gaps on III–V substrates by electron beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11

3. Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off;Beilstein Journal of Nanotechnology;2012-02-06

4. Deformation of metallic liquid drop by electric field for contacts in molecular–organic electronics;Proceedings of the Royal Society A: Mathematical, Physical and Engineering Sciences;2009-03-11

5. Carbon Nanofiber Electrodes and Controlled Nanogaps for Scanning Electrochemical Microscopy Experiments;Analytical Chemistry;2006-09-06

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