Nitrogen-Doped Graphene for High-Performance Ultracapacitors and the Importance of Nitrogen-Doped Sites at Basal Planes

Author:

Jeong Hyung Mo1,Lee Jung Woo1,Shin Weon Ho1,Choi Yoon Jeong1,Shin Hyun Joon2,Kang Jeung Ku13,Choi Jang Wook3

Affiliation:

1. Department of Materials Science and Engineering, Korea Advanced Institute of Science & Technology, 373-1, Guseong Dong, Yuseong Gu, Daejeon 305-701, Republic of Korea

2. Pohang Accelerator Laboratory and Department of Physics, Pohang University of Science and Technology, San 31, Hyojadong, Pohang 790-784, Republic of Korea

3. NanoCentury KAIST Institute and Graduate School of EEWS (WCU), Korea Advanced Institute of Science & Technology, 373-1, Guseong Dong, Yuseong Gu, Daejeon 305-701, Republic of Korea

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

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