Environment-Friendly Photolithography Using Poly(N-isopropylacrylamide)-Based Thermoresponsive Photoresists-Reference-Cited by-同舟云学术

Environment-Friendly Photolithography Using Poly(N-isopropylacrylamide)-Based Thermoresponsive Photoresists

Published:2009-08-28 Issue:37 Volume:131 Page:13315-13319
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Ionov Leonid¹,Diez Stefan¹

Affiliation:

1. Max-Planck-Institute of Molecular Cell Biology and Genetics, Pfotenhauer Str. 108, 01307 Dresden, Germany, and Leibniz Institute of Polymer Research Dresden, Hohe Str. 6, 01069 Dresden, Germany

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja902660s

Reference25 articles.

1. Formation of Patterned Microstructures of Conducting Polymers by Soft Lithography, and Applications in Microelectronic Device Fabrication

2. Reversible Chemical Patterning on Stimuli-Responsive Polymer Film: Environment-Responsive Lithography

3. Simple and Fast Method for the Fabrication of Switchable Bicomponent Micropatterned Polymer Surfaces

4. Surface-Directed Liquid Flow Inside Microchannels

5. Smart Microfluidic Channels

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