Formation of Amorphous Silicon by the Low-Temperature Tunneling Reaction of H Atoms with Solid Thin Film of SiH4 at 10 K
Author:
Affiliation:
1. Clean Energy Research Center, Yamanashi University, Takeda-4, Kofu 400-8511, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp010553b
Reference22 articles.
1. Advances in Chemical Physics
2. Formation of formaldehyde and methanol from the reactions of H atoms with solid CO at 10–20 K
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4. Reactions of Hydrogen Atoms with Solid, Thin Films of Acetone and 2‐Propanol at 13 K
5. Reaction of H Atoms with Solid C2H4and C2H6at 13 K
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