Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon−Carbon and Silica Films from Organosilicon Sources-Reference-Cited by-同舟云学术

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Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon−Carbon and Silica Films from Organosilicon Sources

Published:2001-05-01 Issue:5 Volume:13 Page:1884-1895
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Wróbel A. M.,Walkiewicz-Pietrzykowska A.,Hatanaka Y.,Wickramanayaka S.,Nakanishi Y.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm001044%2B

Reference84 articles.

1. Effect of UV irradiation of the film during plasma chemical vapour deposition

2. Remote hydrogen plasma chemical vapor deposition using an organopentasilane cluster as a novel film‐forming precursor: Mechanism of the activation step

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