Thickness-Dependent Domain Relaxation Dynamics Study in Epitaxial K0.5Na0.5NbO3 Ferroelectric Thin Films-Reference-Cited by-同舟云学术

Thickness-Dependent Domain Relaxation Dynamics Study in Epitaxial K0.5Na0.5NbO3 Ferroelectric Thin Films

Published:2021-07-26 Issue:30 Volume:13 Page:36407-36415
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Pradhan Soumen¹,Rath Martando¹,David Adrian²,Kumar Deepak²,Prellier Wilfrid²^ORCID,Rao M. S. Ramachandra¹^ORCID

Affiliation:

1. Department of Physics, Materials Science Research Centre and Nano Functional Materials Technology Centre, Indian Institute of Technology Madras, Chennai 600 036, India

2. Laboratorie CRISMAT, CNRS UMR 6508, ENSICAEN, Normandie Universite, F-14050 Caen Cedex 4, France

Funder

UniversitÃ© de Caen Normandie

Defence Research and Development Organisation

Department of Science and Technology (DST), New Delhi

Laboratoire Franco-Indien pour le Cooperation Scientifique

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c05699

Reference59 articles.

1. Review of piezoelectric micromachined ultrasonic transducers and their applications

2. Ultrathin Ferroelectric Films: Growth, Characterization, Physics and Applications

3. A review of flexible perovskite oxide ferroelectric films and their application

4. Piezoelectric Polymer and Paper Substrates: A Review

5. Scanning Nonlinear Dielectric Microscopy Nano-Science and Technology for Next Generation High Density Ferroelectric Data Storage

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