Chemical and Electronic Investigation of Buried NiO1−δ, PCBM, and PTAA/MAPbI3–xClx Interfaces Using Hard X-ray Photoelectron Spectroscopy and Transmission Electron Microscopy-Reference-Cited by-同舟云学术

Chemical and Electronic Investigation of Buried NiO1−δ, PCBM, and PTAA/MAPbI3–xClx Interfaces Using Hard X-ray Photoelectron Spectroscopy and Transmission Electron Microscopy

Published:2021-10-13 Issue:42 Volume:13 Page:50481-50490
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Gueye Ibrahima¹²^ORCID,Shirai Yasuhiro³^ORCID,Khadka Dhruba B.³^ORCID,Seo Okkyun¹²^ORCID,Hiroi Satoshi¹²^ORCID,Yanagida Masatoshi³^ORCID,Miyano Kenjiro³^ORCID,Sakata Osami¹²⁴⁵^ORCID

Affiliation:

1. Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), 1-1-1 Kouto, Sayo, Hyogo 679-5148, Japan

2. Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, 1-1-1 Kouto, Sayo, Hyogo 679-5148, Japan

3. Centre for Green Research on Energy and Environmental Materials, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan

4. Department of Materials Science and Engineering, Tokyo Institute of Technology, Nagatsuta, Midori, Yokohama 226-8502, Japan

5. Center for Synchrotron Radiation Research, Japan Synchrotron Radiation Research Institute (JASRI), Kouto, Sayo, Hyogo 679-5198, Japan

Funder

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c11215

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