Digital Control of SiO2−TiO2 Mixed-Metal Oxides by Pulsed PECVD
Author:
Affiliation:
1. Department of Chemical Engineering, Colorado School of Mines, Golden, Colorado 80401
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am900506y
Reference34 articles.
1. Self-limiting growth of tantalum oxide thin films by pulsed plasma-enhanced chemical vapor deposition
2. Comparison of Electrolyte Performance for Ta[sub 2]O[sub 5] Thin Films Produced by Pulsed and Continuous Wave PECVD
3. Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition
4. Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition system engineered for self-limiting growth of aluminum oxide thin films
5. Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
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