Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets-Reference-Cited by-同舟云学术

Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets

Published:2009-12-21 Issue:2 Volume:22 Page:476-481
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Li Cheng¹,Hong Guosong¹,Qi Limin¹

Affiliation:

1. Beijing National Laboratory for Molecular Sciences (BNLMS), State Key Laboratory for Structural Chemistry of Unstable and Stable Species, College of Chemistry, Peking University, Beijing 100871, People’s Republic of China

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm9031946

Reference48 articles.

1. New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

2. Large-Area Nanoscale Patterning: Chemistry Meets Fabrication

3. Extraordinary optical transmission through sub-wavelength hole arrays

4. A New Generation of Sensors Based on Extraordinary Optical Transmission

5. Spatially confined light output of a crystalline zinc oxide nanonet laser

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