Highly Condensed Fluorinated Methacrylate Hybrid Material for Transparent Low-k Passivation Layer in LCD-TFT
Author:
Affiliation:
1. Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305−701, Republic of Korea
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am9008677
Reference28 articles.
1. Krishnamoorthy, A., Spear, R., Gebrebrhan, A., Stifanos, M., Bien, H., Lowe, M., Yellowaga, D., Smith, P., O’Rourke, S., Loy, D., Dailey, J., Marrs, M., and Ageno, S.Presented at the Society for Information Display Symposium, Seminar, and Exhibition, Los Angeles, May 2008;SID2008 Digest;Society of Information Display:Campbell, CA, 2008; Vol.39, pp140−142.
2. High Transmittance TFT-LCD Panels Using Low-<tex>$kappa$</tex>CVD Films
3. Improvement of Hydrogenated Amorphous-Silicon TFT Performances With Low-$k$Siloxane-Based Hydrogen Silsesquioxane (HSQ) Passivation Layer
4. Ultra Low-kFilms Derived from Hyperbranched Polycarbosilanes (HBPCS)
5. Ultralow-k nanoporous organosilicate dielectric films imprinted with dendritic spheres
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