Truly Quantitative XPS Characterization of Organic Monolayers on Silicon: Study of Alkyl and Alkoxy Monolayers on H−Si(111)-Reference-Cited by-同舟云学术

Truly Quantitative XPS Characterization of Organic Monolayers on Silicon: Study of Alkyl and Alkoxy Monolayers on H−Si(111)

Published:2005-05-06 Issue:21 Volume:127 Page:7871-7878
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Wallart Xavier¹,Henry de Villeneuve Catherine¹,Allongue Philippe¹

Affiliation:

1. Contribution from the Institut d'Electronique, de Microélectronique et de Nanotechnologie, CNRS-UMR 8520, Avenue Poincaré, B.P. 69, 59652 Villeneuve d'Ascq Cedex, France, and Laboratoire de Physique de la Matière Condensée, CNRS-UMR 7643, Ecole Polytechnique, 91128 Palaiseau, France

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja0430797

Reference48 articles.

1. Alkyl monolayers covalently bonded to silicon surfaces

2. Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated Silicon

3. Determination of the bonding of alkyl monolayers to the Si(111) surface using chemical-shift, scanned-energy photoelectron diffraction

4. Alkyl-terminated Si(111) surfaces: A high-resolution, core level photoelectron spectroscopy study

5. Photoreactivity of Unsaturated Compounds with Hydrogen-Terminated Silicon(111)

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