Enhanced Photochemistry of Ethyl Chloride on Ag Nanoparticles
Author:
Affiliation:
1. Institute of Chemistry, The Hebrew University of Jerusalem, Edmund J. Safra Campus—Givat Ram, Jerusalem 91904, Israel
Funder
United States - Israel Binational Science Foundation
Israel Science Foundation
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl503700y
Reference32 articles.
1. Powering the planet: Chemical challenges in solar energy utilization
2. Photochemistry on Metal Nanoparticles
3. Plasmonic-metal nanostructures for efficient conversion of solar to chemical energy
4. Direct Photocatalysis by Plasmonic Nanostructures
5. Size Effects in Thermal and Photochemistry of(NO)2on Ag Nanoparticles
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Formamidinium Halide Perovskite and Carbon Nitride Thin Films Enhance Photoreactivity under Visible Light Excitation;The Journal of Physical Chemistry A;2022-06-02
2. Buffer Layer Assisted Chemistry over Amorphous Solid Water: Oxide Thin Film or Metallic Nanoparticles Formation;Langmuir;2018-02-13
3. CsPbBr3 and CH3NH3PbBr3 promote visible-light photo-reactivity;Physical Chemistry Chemical Physics;2018
4. Photon Energy Threshold in Direct Photocatalysis with Metal Nanoparticles: Key Evidence from the Action Spectrum of the Reaction;The Journal of Physical Chemistry Letters;2017-05-23
5. Fusion behaviour and mechanism of ultrafine Ag-Cu nanoparticles induced by electron beam irradiation;Journal of Materials Science: Materials in Electronics;2017-02-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3