Quantitative depth profiling resonance ionization mass spectrometry of semiconductors with minimum standardization
Author:
Publisher
American Chemical Society (ACS)
Subject
Analytical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ac00009a016
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3. Characterization of InGaAsP materials by ultrahigh intensity post-ionization mass spectrometry: Relative sensitivity factors for zinc versus bulk constituents;Journal of Materials Research;1996-02
4. Detection of Sputtered Neutrals by Ultrahigh-Intensity Postionization in the Near-Infrared;Analytical Chemistry;1995-11-15
5. Depth profiling of copper thin films by resonant laser ablation;Applied Physics A Materials Science and Processing;1995-08
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