Interfacial Dipole Formation and Surface-Electron Confinement in Low-Coverage Self-Assembled Thiol Layers: Thiophenol and p-Fluorothiophenol on Cu(111)-Reference-Cited by-同舟云学术

Interfacial Dipole Formation and Surface-Electron Confinement in Low-Coverage Self-Assembled Thiol Layers: Thiophenol and p-Fluorothiophenol on Cu(111)

Published:2012-11-26 Issue:12 Volume:6 Page:10622-10631
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Hong Sung-Young¹,Yeh Po-Chun¹,Dadap Jerry I.¹,Osgood Richard. M.¹

Affiliation:

1. Department of Chemistry, ‡Interdepartmental Program in Solid State Science and Engineering, §Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027, United States

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn303715d

Reference56 articles.

1. Organic Electronic Devices and Their Functional Interfaces

2. Energy Level Alignment and Interfacial Electronic Structures at Organic/Metal and Organic/Organic Interfaces

3. The Interface Energetics of Self-Assembled Monolayers on Metals

4. Electronic structure and electrical properties of interfaces between metals and ?-conjugated molecular films

5. Cooperative effect in electron transfer between metal substrate and organized organic layers

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