Secondary ion emission for surface and in-depth analysis of tantalum thin films-Reference-Cited by-同舟云学术

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Secondary ion emission for surface and in-depth analysis of tantalum thin films

Published:1973-05-01 Issue:6 Volume:45 Page:869-880
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Morabito J. M.,Lewis R. K.

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ac60328a037

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3. Contributions to computer-aided interpretation of ion sputtering depth profiling;Spectrochimica Acta Part B: Atomic Spectroscopy;1994-09

4. Secondary Ion Mass Spectrometry;Catalyst Characterization;1994

5. High resolution compositional depth profiling;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1991-05

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