Ultrathin W−Al Dual Interlayer Approach to Depositing Smooth and Adherent Nanocrystalline Diamond Films on Stainless Steel-Reference-Cited by-同舟云学术

Ultrathin W−Al Dual Interlayer Approach to Depositing Smooth and Adherent Nanocrystalline Diamond Films on Stainless Steel

Published:2010-01-12 Issue:2 Volume:2 Page:335-338
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Li Y. S.¹,Tang Y.¹,Yang Q.¹,Maley J.¹,Sammynaiken R.¹,Regier T.¹,Xiao C.¹,Hirose A.¹

Affiliation:

1. Plasma Physics Laboratory, University of Saskatchewan, 116 Science Place, Saskatoon, Canada SK S7N 5E2, Department of Mechanical Engineering, University of Saskatchewan, Saskatoon, Canada SK S7N 5A9, Saskatchewan Structural Sciences Center, University of Saskatchewan, Saskatoon, Canada SK S7N 5C9, and Canada Light Source Inc., University of Saskatchewan, Saskatoon, Canada SK S7N 0X4

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am9007159

Reference24 articles.

1. Influence of H2S addition during diamond deposition on hardmetal substrates

2. Engineered Interfaces for Adherent Diamond Coatings on Large Thermal-Expansion Coefficient Mismatched Substrates

3. Effect of the chemical nature of transition‐metal substrates on chemical‐vapor deposition of diamond

4. The effects of substrate compositions on adhesion of diamond films deposited on Fe-base alloys

5. Novel pretreatment of hard metal substrate for better performance of diamond coated cutting tools

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