Observation of Excitonic Rydberg States in Monolayer MoS2 and WS2 by Photoluminescence Excitation Spectroscopy
Author:
Affiliation:
1. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
Funder
Basic Energy Sciences
Division of Graduate Education
W.M. Keck Foundation
Office of Science
Alexander von Humboldt-Stiftung
Division of Materials Research
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl504868p
Reference57 articles.
1. Atomically ThinMoS2: A New Direct-Gap Semiconductor
2. Emerging Photoluminescence in Monolayer MoS2
3. Evolution of Electronic Structure in Atomically Thin Sheets of WS2and WSe2
4. Optical Properties and Band Gap of Single- and Few-Layer MoTe2 Crystals
5. Photoluminescence from Chemically Exfoliated MoS2
Cited by 331 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. High-temperature observation of intralayer, interlayer, and Rydberg excitons in bulk van der Waals alloy single crystals;Physical Review B;2024-08-26
2. Axially‐Polarized Excitonic Series and Anisotropic van der Waals Stacked Heterojunction in a Quasi‐1D Layered Transition‐Metal Trichalcogenide;Advanced Science;2024-08-05
3. Reactivity of Sulfur Vacancy-Rich MoS2 to Water Dissociation;The Journal of Physical Chemistry C;2024-06-15
4. Intercalation of quaternary ammonium cations as a key factor of electron storage in MoS2 thin films;Applied Physics Reviews;2024-06-01
5. 2D Hybrid Perovskites: From Static and Dynamic Structures to Potential Applications;Advanced Materials;2024-05-21
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3