Nickel Deposition on Fluorinated, Aromatic Self-Assembled Monolayers: Chemically Induced Cross-Linking as a Tool for the Preparation of Well-Defined Top Metal Films
Author:
Affiliation:
1. Angewandte Physikalische Chemie, Universität Heidelberg, 69120 Heidelberg, Germany
2. Institute of Inorganic and Analytical Chemistry, University of Frankfurt, Max-von-Laue- Str. 7, 60438 Frankfurt/Main, Germany
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp5025334
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