Surface Functional Group Effect on Atomic Force Microscope Anodization Lithography-Reference-Cited by-同舟云学术

Surface Functional Group Effect on Atomic Force Microscope Anodization Lithography

Published:2005-08-10 Issue:19 Volume:21 Page:8839-8843
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Lee Wonbae¹,Lee Haiwon¹,Chun Myung-Suk¹

Affiliation:

1. Department of Chemistry, Hanyang University, Seoul 133-791, Korea, The National Program for Tera-Level Nanodevices, Seoul 136-791, Korea, and Complex Fluids Research Laboratory, Korea Institute of Science and Technology, Seoul 130-650, Korea

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la0508083

Reference25 articles.

1. Scanning electron microscopy can form images of patterns in self-assembled monolayers

2. Scanning probe anodization: Nanolithography using thin films of anodically oxidizable materials as resists

3. Silicon nanowires with sub 10 nm lateral dimensions: From atomic force microscope lithography based fabrication to electrical measurements

4. Atomic force microscope based patterning of carbonaceous masks for selective area growth on semiconductor surfaces

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