Protection−Deprotection Chemistry to Control Styrene Self-Directed Line Growth on Hydrogen-Terminated Si(100)
Author:
Affiliation:
1. National Institute for Nanotechnology, Edmonton, Alberta, Canada, and Department of Physics, University of Alberta, Edmonton, Alberta, Canada
Publisher
American Chemical Society (ACS)
Subject
Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis
Link
https://pubs.acs.org/doi/pdf/10.1021/ja045012p
Reference13 articles.
1. CONTROLLED MOLECULAR ADSORPTION ON SILICON: Laying a Foundation for Molecular Devices
2. Self-directed growth of molecular nanostructures on silicon
3. Patterning of Vinylferrocene on H−Si(100) via Self-Directed Growth of Molecular Lines and STM-Induced Decomposition
4. A Self-Directed Growth Process for Creating Covalently Bonded Molecular Assemblies on the H−Si(100)-3×1 Surface
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