Electron Beam-Induced Damage of Alkanethiolate Self-Assembled Monolayers Adsorbed on GaAs (001): A Static SIMS Investigation-Reference-Cited by-同舟云学术

Electron Beam-Induced Damage of Alkanethiolate Self-Assembled Monolayers Adsorbed on GaAs (001): A Static SIMS Investigation

Published:2009-11-13 Issue:12 Volume:114 Page:5400-5409
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Zhou Chuanzhen¹,Jones Jason C.¹,Trionfi Aaron¹,Hsu Julia W. P.¹,Walker Amy V.¹

Affiliation:

1. Department of Chemistry and Center for Materials Innovation, Washington University in St. Louis, Campus Box 1134, One Brookings Drive, St. Louis, Missouri 63130, and Center for Integrated Nanotechnologies, Sandia National Laboratories, P.O. Box 5800 MS-1415, Albuquerque, New Mexico 87185-1415

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp905612p

Reference68 articles.

1. Formation and Structure of Self-Assembled Monolayers

2. Structure and growth of self-assembling monolayers

3. Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects

4. Self-assembled monolayer electron-beam resists on GaAs and SiO2

5. Electron beam lithography with monolayers of alkylthiols and alkylsiloxanes

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