Reduction of N2O on MgO/Ag(100) via UV-Photoinduced Trapped Electrons
Author:
Affiliation:
1. Fachbereich Physik, Freie Universität Berlin, Arnimallee 14, 14195 Berlin, Germany
2. Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4- 6, 14195 Berlin, Germany
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp109385s
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