Photosensitized Oxidative DNA Damage: From Hole Injection to Chemical Product Formation and Strand Cleavage-Reference-Cited by-同舟云学术

Photosensitized Oxidative DNA Damage: From Hole Injection to Chemical Product Formation and Strand Cleavage

Published:2007-07-07 Issue:30 Volume:129 Page:9321-9332
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Yun Byeong Hwa¹,Lee Young Ae¹,Kim Seog K.¹,Kuzmin Vladimir¹,Kolbanovskiy Alexander¹,Dedon Peter C.¹,Geacintov Nicholas E.¹,Shafirovich Vladimir¹

Affiliation:

1. Contribution from the Chemistry Department, New York University, 31 Washington Place, New York, New York 10003-5180, Chemistry Department, Yeongnam University, Gyongsan, Korea 712-749, Institute of Biochemical Physics, Russian Academy of Sciences, Moscow V-334, Russia, and Biological Engineering Division, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja066954s

Reference58 articles.

1. Long-range oxidative damage to DNA: Effects of distance and sequence

2. Long-Range Charge Transfer in DNA: Transient Structural Distortions Control the Distance Dependence

3. Long-Distance Electron Transfer Through DNA

4. Topology and reorganization of a human TFIID–promoter complex

5. Dynamics of Photoinduced Charge Transfer and Hole Transport in Synthetic DNA Hairpins

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