Product Study of the Reaction of CH3 with OH Radicals at Low Pressures and Temperatures of 300 and 612 K†
Author:
Affiliation:
1. Chemistry Department 555A, Brookhaven National Laboratory, P. O. Box 5000, Upton, New York 11973-5000
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp045792o
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