Photoinduced High-Quality Ultrathin SiO2 Film from Hybrid Nanosheet at Room Temperature
Author:
Affiliation:
1. Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
Publisher
American Chemical Society (ACS)
Subject
Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis
Link
https://pubs.acs.org/doi/pdf/10.1021/ja803852w
Reference23 articles.
1. Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits
2. High-Resolution Inkjet Printing of All-Polymer Transistor Circuits
3. Gate Insulators in Organic Field-Effect Transistors
4. Low-Voltage Organic Field-Effect Transistors and Inverters Enabled by Ultrathin Cross-Linked Polymers as Gate Dielectrics
5. Rapid photochemical deposition of silicon dioxide films using an excimer lamp
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