Optical Emission from Microwave Activated C/H/O Gas Mixtures for Diamond Chemical Vapor Deposition
Author:
Affiliation:
1. School of Chemistry, University of Bristol, Bristol BS8 1TS, U.K.
2. Skobel’tsyn Institute of Nuclear Physics, Moscow State University, Leninskie Gory, Moscow 119991, Russia
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp306191y
Reference35 articles.
1. Exploring the Plasma Chemistry in Microwave Chemical Vapor Deposition of Diamond from C/H/O Gas Mixtures
2. Gas temperature measurements by laser spectroscopic techniques and by optical emission spectroscopy
3. Quantitative analysis of diamond deposition reactor efficiency
4. Spectroscopic analysis and chemical kinetics modeling of a diamond deposition plasma reactor
5. Validation of actinometry for estimating relative hydrogen atom densities and electron energy evolution in plasma assisted diamond deposition reactors
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3. Effect of the admixture of N2 to low pressure, low temperature H2-CH4-CO2 microwave plasmas used for large area deposition of nanocrystalline diamond films;Journal of Physics D: Applied Physics;2020-08-17
4. Imaging and Modeling the Optical Emission from CH Radicals in Microwave Activated C/H Plasmas;The Journal of Physical Chemistry A;2019-10-24
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