In Situ Reaction Mechanism Studies on Atomic Layer Deposition of Sb2Te3 and GeTe from (Et3Si)2Te and Chlorides
Author:
Affiliation:
1. Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, P.O. Box 55, FIN-00014 University of Helsinki, Finland
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm902180d
Reference41 articles.
1. Suntola, T.; Antson, J.U.S. Pat.4058430, 1977.
2. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
3. In Situ Reaction Mechanism Studies on Atomic Layer Deposition of ZrO2 from (CpMe)2Zr(OMe)Me and Water or Ozone
4. Self-limiting monolayer epitaxy of wide gap II–VI superlattices
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