Nanogap-Assisted Surface Plasmon Nanolithography-Reference-Cited by-同舟云学术

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Nanogap-Assisted Surface Plasmon Nanolithography

Published:2010-01-21 Issue:3 Volume:1 Page:657-662
ISSN:1948-7185
Container-title:The Journal of Physical Chemistry Letters
language:en
Short-container-title:J. Phys. Chem. Lett.

Author:

Ueno Kosei¹²,Takabatake Satoaki¹,Nishijima Yoshiaki¹,Mizeikis Vygantas³,Yokota Yukie¹,Misawa Hiroaki¹

Affiliation:

1. Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan

2. PRESTO, Japan Science and Technology Agency, Kawaguchi 332-0012, Japan

3. Division of Global Research Leaders (Research Institute of Electronics), Shizuoka University, Hamamatsu 432-8561, Japan

Publisher

American Chemical Society (ACS)

Subject

General Materials Science,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jz9002923

Reference33 articles.

1. Near-field lithography as prototype nano-fabrication tool

2. Evaluation of the dynamic range and spatial resolution of nonadiabatic optical near-field lithography through fabrication of Fresnel zone plates

3. Surface plasmon subwavelength optics

4. Watching energy transfer

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