Removal of Aromatic Compounds in Gas by Electron Attachment
Author:
Affiliation:
1. Department of Chemical Engineering, Kyoto University, Kyoto 606-8501, Japan
2. Department of Chemical Engineering, Chulalongkorn University, Patumwan, Bangkok 10330, Thailand
Publisher
American Chemical Society (ACS)
Subject
Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ie980071v
Reference15 articles.
1. Masuda, S. Pulse Corona Induced Plasma Chemical ProcessA Horizon of New Plasma Chemical Technologies.Proceedingsofthe8thInternationalSymposiumonPlasmaChemistry; International Union of Pure & Applied Chemistry: Tokyo, 1987; p 2187.
2. Combined removal of SO/sub 2/, NO/sub x/, and fly ash from simulated flue gas using pulsed streamer corona
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