Cubic dielectrics for superconducting electronics. In situ growth of epitaxial strontium aluminum tantalate (Sr2AlTaO6) thin films using metalorganic chemical vapor deposition-Reference-Cited by-同舟云学术

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Cubic dielectrics for superconducting electronics. In situ growth of epitaxial strontium aluminum tantalate (Sr2AlTaO6) thin films using metalorganic chemical vapor deposition

Published:1994-01-01 Issue:1 Volume:6 Page:18-20
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Han Bin,Neumayer Deborah A.,Goodreau Bruce H.,Marks Tobin J.,Zhang Hong,Dravid Vinayak P.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00037a006

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. ChemInform Abstract: Cubic Dielectrics for Superconducting Electronics. In situ Growth of Epitaxial Sr2AlTaO6 Thin Films Using Metalorganic Chemical Vapor Deposition;ChemInform;2010-08-19

2. Preparation of Sr2AlTaO6Insulating Films on YBa2Cu3O7-δby Metalorganic Chemical Vapor Deposition with Purified Sr Source;Japanese Journal of Applied Physics;2002-02-15

3. Dependence of crystallinity on oxygen pressure and growth mode of La0.3Sr1.7AlTaO6 thin films on different substrates;Journal of Applied Physics;2000-04-15

4. Metal-Organic Chemical Vapor Deposition of Zn-In-Sn-O and Ga-In-Sn-O Transparent Conducting Oxide Thin Films;MRS Proceedings;1999

5. Heteroepitaxy of LaAlO3 (100) on SrTiO3 (100): In Situ Growth of LaAlO3 Thin Films by Metal−Organic Chemical Vapor Deposition from a Liquid Single Source;Chemistry of Materials;1998-11-13

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