Direct Experimental Evidence of Metal-Mediated Etching of Suspended Graphene
Author:
Affiliation:
1. SuperSTEM Laboratory, STFC Daresbury Campus, Daresbury WA4 4AD, United Kingdom
2. School of Computational Sciences, Korea Institute for Advanced Study, Seoul 130-722, Korea. The first two authors have contributed equally to the work.
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn300452y
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5. Layer-by-Layer Removal of Graphene for Device Patterning
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