Polyhedral Oligomeric Silsesquioxane (POSS) Based Resists: Material Design Challenges and Lithographic Evaluation at 157 nm
Author:
Affiliation:
1. Institute of Microelectronics, NCSR “Demokritos”, 15310 Ag. Paraskevi, Athens, Greece, and Laboratoire des Plasmas et des Couches Minces, Institut des Materiaux “Jean Rouxel”, BP 32229, 44322 Nantes, France
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm035089x
Reference42 articles.
1. Resist and process implementation issues in future lithography processes for ULSI applications
2. Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
3. Development of 157 nm Resist Using Highly Exact Theoretical Calculation of Absorption Spectra
4. Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results
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