Mechanism of UV- and VUV-Induced Etching of Poly(methyl methacrylate)
Author:
Affiliation:
1. Department of Image Science and Technology, Faculty of Engineering, Chiba University, Yayoicho, Chiba 260, Japan
2. Photon Factory, National Laboratory for High-Energy Physics, Tsukuba, Ibaraki 305, Japan
Publisher
American Chemical Society
Link
https://pubs.acs.org/doi/pdf/10.1021/bk-1989-0412.ch026
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