Examination of Etching Agent and Etching Mechanism on Femotosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates-Reference-Cited by-同舟云学术

Examination of Etching Agent and Etching Mechanism on Femotosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates

Published:2009-04-22 Issue:27 Volume:113 Page:11560-11566
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Kiyama Satoshi¹,Matsuo Shigeki¹,Hashimoto Shuichi¹,Morihira Yasushi¹

Affiliation:

1. Department of Ecosystem Engineering, The University of Tokushima, Tokushima 770-8506, Japan, and Tokyo Instruments Inc., Nishikasai, Tokyo 134-0088, Japan

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp900915r

Reference38 articles.

1. Femtosecond waveguide writing: a new avenue to three-dimensional integrated optics

2. Femtosecond laser modification of glass

3. Femtosecond laser micromachining in transparent materials

4. Three-Dimensional Micro- and Nano-Structuring of Materials by Tightly Focused Laser Radiation

5. Laser microfabrication and rotation of ship-in-a-bottle optical rotators

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