Chemically Amplified Photosensitive Polybenzoxazoles Based on tert-Butoxycarbonyl Protected Hyperbranched Poly(o-hydroxyamide)s
Author:
Affiliation:
1. Department of Organic and Polymeric Materials, Tokyo Institute of Technology, O-okayama, Meguro-ku, Tokyo 152-8550, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma021692%2B
Reference24 articles.
1. Thermally stable photoresist polymer
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