Deposition of Thin Polymeric Films from Liquid Carbon Dioxide Using a High-Pressure Free-Meniscus Coating Process-Reference-Cited by-同舟云学术

Deposition of Thin Polymeric Films from Liquid Carbon Dioxide Using a High-Pressure Free-Meniscus Coating Process

Published:2003-12-11 Issue:2 Volume:43 Page:515-524
ISSN:0888-5885
Container-title:Industrial & Engineering Chemistry Research
language:en
Short-container-title:Ind. Eng. Chem. Res.

Author:

Novick Brian J.¹,DeSimone Joseph M.¹,Carbonell Ruben G.¹

Affiliation:

1. Department of Chemical Engineering, North Carolina State University, Riddick Hall, Raleigh, North Carolina 27695-7905, and Venable and Kenan Laboratories, Department of Chemistry, University of North Carolina, Chapel Hill, North Carolina 27599-3290

Publisher

American Chemical Society (ACS)

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ie030688z

Reference46 articles.

1. Lubricants and overcoats for magnetic storage media

2. Tribology and Mechanics of Magnetic Storage Devices

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