Hierarchical Photocomposition of Heteronanostructures in a Surfactant–Polysiloxane Hybrid Film toward Next-Generation Nanolithography-Reference-Cited by-同舟云学术

Hierarchical Photocomposition of Heteronanostructures in a Surfactant–Polysiloxane Hybrid Film toward Next-Generation Nanolithography

Published:2020-05-04 Issue:6 Volume:2 Page:2284-2290
ISSN:2637-6105
Container-title:ACS Applied Polymer Materials
language:en
Short-container-title:ACS Appl. Polym. Mater.

Author:

Hara Mitsuo¹^ORCID,Wakitani Naoyuki¹,Kodama Atsuki¹,Nagano Shusaku²^ORCID,Seki Takahiro¹^ORCID

Affiliation:

1. Department of Molecular and Macromolecular Chemistry, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan

2. Nagoya University Venture Business Laboratory, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan

Funder

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

Organic Chemistry,Polymers and Plastics,Process Chemistry and Technology

Link

https://pubs.acs.org/doi/pdf/10.1021/acsapm.0c00253

Reference39 articles.

1. Block Copolymer−Ceramic Hybrid Materials from Organically Modified Ceramic Precursors

2. Ordered mesoporous molecular sieves synthesized by a liquid-crystal template mechanism

3. A new family of mesoporous molecular sieves prepared with liquid crystal templates

4. Synthesis of highly ordered mesoporous materials from a layered polysilicate

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