A Realizable Green Strategy to Negative Polyurethane Photoresists through the Application of a Silicone Resin Photoinitiator

Author:

Liao Wen1,Xu Can1,Wu Xiang1,Xiong Ying1,Li Zhen1ORCID,Tang Hongding1ORCID

Affiliation:

1. Engineering Research Center of Organosilicon Compounds & Materials, Ministry of Education, Sauvage Center for Molecular Sciences, College of Chemistry and Molecular Sciences, Wuhan University, Wuhan 430072, P. R. China

Funder

National Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

Organic Chemistry,Polymers and Plastics,Process Chemistry and Technology

Reference44 articles.

1. SU-8 nano-nozzle fabrication for electrohydrodynamic jet printing using UV photolithography

2. Advances in Nanoimprint Lithography

3. Photopatternable Metallopolymers:  Photo-Cross-Linking and Photolithography of Polyferrocenylsilane Methacrylates

4. Photolithographic Route to the Fabrication of Micro/Nanowires of III-V Semiconductors

5. Toennies, D.; Cullmann, E.; Gong, L. Specialized photolithography equipment and thick photo resist for wafer level packaging and wafer bumping. 2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings; IEEE: 2001, 94–99.

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3