Photoelectrochemical Detection of Oxidative DNA Damage Induced by Fenton Reaction with Low Concentration and DNA-Associated Fe2+-Reference-Cited by-同舟云学术

Photoelectrochemical Detection of Oxidative DNA Damage Induced by Fenton Reaction with Low Concentration and DNA-Associated Fe2+

Published:2008-03-13 Issue:14 Volume:112 Page:4461-4464
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Jia Suping¹,Liang Minmin¹,Guo Liang-Hong¹

Affiliation:

1. State Key Laboratory of Environmental Chemistry and Ecotoxicology, Research Center for Eco-environmental Sciences, Chinese Academy of Sciences, 18 Shuangqing Road, P.O. Box 2871, Beijing 100085, China

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp711528z

Reference26 articles.

1. Metals, Toxicity and Oxidative Stress

2. Toxic DNA Damage by Hydrogen Peroxide Through the Fenton Reaction in Vivo and in Vitro

3. Three chemically distinct types of oxidants formed by iron-mediated Fenton reactions in the presence of DNA.

4. Bimodal Pattern of Killing of Chinese Hamster V79 Variant Cells by Hydrogen Peroxide

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