Controlled Electroless Deposition of Noble Metals on Silicon Substrates Using Self-Assembled Monolayers as Molecular Resists To Generate Nanopatterned Surfaces for Electronics and Plasmonics-Reference-Cited by-同舟云学术

Controlled Electroless Deposition of Noble Metals on Silicon Substrates Using Self-Assembled Monolayers as Molecular Resists To Generate Nanopatterned Surfaces for Electronics and Plasmonics

Published:2019-10-18 Issue:11 Volume:2 Page:7114-7125
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Ulapane Sasanka B.¹,Kamathewatta Nilan J. B.¹,Ashberry Hannah M.¹,Berrie Cindy L.¹^ORCID

Affiliation:

1. Department of Chemistry, University of Kansas, Lawrence, Kansas 66045, United States

Funder

National Science Foundation

University of Kansas

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.9b01641

Reference70 articles.

1. 30 years of electroless plating for semiconductor and polymer micro-systems

2. Electroless deposition of gold on silicon and its potential applications: review

3. Biological efficacy of electroless-deposited silver on plasma activated polyurethane

4. Co‐Based Soft Magnetic Films Produced by Electroless Deposition

5. Controlled Electroless Deposition of Noble Metal Nanoparticle Films on Germanium Surfaces

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