In Situ UPS Study of the Formation of FeSi Films from cis-Fe(SiCl3)2(CO)4-Reference-Cited by-同舟云学术

In Situ UPS Study of the Formation of FeSi Films from cis-Fe(SiCl3)2(CO)4

Published:1998-12-01 Issue:26 Volume:17 Page:5825-5829
ISSN:0276-7333
Container-title:Organometallics
language:en
Short-container-title:Organometallics

Author:

Huang Wei¹,Zybill Christian Erich¹,Luo Lan¹,Hieringer Wolfgang¹,Huang Hsing Hua¹

Affiliation:

1. Institute for Materials Research and Engineering IMRE, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260, and Lehrstuhl für Anorganische Chemie, Technische Universität München, Lichtenbergstrasse 4, 85747 Garching, Germany

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/om980550u

Reference36 articles.

1. Semiconducting silicide-silicon heterostructures: growth, properties and applications

2. Optical properties of semiconducting iron disilicide thin films

3. Solid phase epitaxy of β‐FeSi2 on Si(100)

4. Formation and Schottky behavior of manganese silicides onn‐type silicon

5. Bonding state of silicon segregated toα-iron surfaces and on iron silicide surfaces studied by electron spectroscopy

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