Reaction Chemistry in the Afterglow of an Oxygen−Helium, Atmospheric-Pressure Plasma-Reference-Cited by-同舟云学术

Reaction Chemistry in the Afterglow of an Oxygen−Helium, Atmospheric-Pressure Plasma

Published:2000-08-01 Issue:34 Volume:104 Page:8027-8032
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Jeong James Y.¹,Park Jaeyoung¹,Henins Ivars¹,Babayan Steve E.¹,Tu Vincent J.¹,Selwyn Gary S.¹,Ding Guowen¹,Hicks Robert F.¹

Affiliation:

1. Chemical Engineering Department, University of California, Los Angeles, California 90095, and Plasma Physics, Los Alamos National Laboratory, Los Alamos, New Mexico 87545

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0012449

Reference30 articles.

1. Oxygen plasma etching for resist stripping and multilayer lithography

2. Lieberman, M. A.; Lichtenberg, A. J.Principles of Plasma Discharges andMaterials Processing; John Wiley & Sons: New York, 1994; p 324.

3. Cold Plasma Materials Fabrication

4. Dissociation and recombination of oxygen atoms produced in a microwave discharge. Part I. Experiment

5. OBSERVATION OF THE TRANSITION IN O2

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