Raman Enhancement of Azobenzene Monolayers on Substrates Prepared by Langmuir−Blodgett Deposition and Electron-Beam Lithography Techniques-Reference-Cited by-同舟云学术

Raman Enhancement of Azobenzene Monolayers on Substrates Prepared by Langmuir−Blodgett Deposition and Electron-Beam Lithography Techniques

Published:2008-09-12 Issue:19 Volume:24 Page:11313-11321
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Marquestaut Nicolas¹,Martin Amanda¹,Talaga David¹,Servant Laurent¹,Ravaine Serge¹,Reculusa Stéphane¹,Bassani Dario M.¹,Gillies Elizabeth¹,Lagugné-Labarthet François¹

Affiliation:

1. Department of Chemistry, University of Western Ontario, 1151 Richmond Street, London, On, N6A5B7, Canada, Institut des Sciences Moléculaires, UMR 5255 CNRS, Université Bordeaux 1, 351 Cours de la Libération, 33405 Talence, France, and Centre de Recherche Paul Pascal, UPR 8641 CNRS, 33600 Pessac, France

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la801697u

Reference58 articles.

1. Ultrasensitive Chemical Analysis by Raman Spectroscopy

2. A Glucose Biosensor Based on Surface-Enhanced Raman Scattering: Improved Partition Layer, Temporal Stability, Reversibility, and Resistance to Serum Protein Interference

3. Measurement of two-photon excitation cross sections of molecular fluorophores with data from 690 to 1050 nm

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