Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
Author:
Affiliation:
1. Department of Applied Sciences and Mechatronics, Munich University of Applied Sciences, München, Germany
2. Massachusetts Institute of Technology, Cambridge, MA, USA
Abstract
Funder
Staff unit centre for research promotion of the university of applied sciences Munich
Bundesministerium für Bildung und Forschung
Publisher
The Royal Society
Subject
Multidisciplinary
Link
https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.201921
Reference20 articles.
1. Itoh K, Lee T, Sakurai T, Schmitt-Landsiedel D, Ho PS, Leu JJ, Lee WW. 2003 Low dielectric constant materials for IC applications, vol. 9. Berlin, Heidelberg: Springer.
2. Thermal decomposition of poly(α,α,α′,α′-tetrafluoro-p-xylylene) in nitrogen and oxygen
3. Novel fluoropolymers formed by an unprecedented SRN1 condensation polymerization mechanism
4. A New, General Synthetic Method for the Preparation of Linear Poly-p-xylylenes
5. Stability of CVD-Produced Polymer Thin Films
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1. Chemical Vapor Deposition of Longitudinal Homogeneous Parylene Thin-Films inside Narrow Tubes;Processes;2022-10-01
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